Cleaning Systems

Features:

• Up to Twelve (12) Inch Diameter Substrate and 9” x 9” Photomask Compatibility on compact models, & up to twenty (20) Inches on the Diagonal/Diameter or Multiple Smaller sizes in larger systems.
• Main Spindle Assembly having DC Brushless Motor (can be upgraded for more control).
• Recipe-Controlled Arm Speed & Travel Positions.
• Radially Exhausted Chamber for Maximum Laminar Flow.
• Automated D.I. Water Line Purge for maintaining a Bacteria Free System
• Stand-alone Polypropylene Cabinet. (SCSx128 model has a stand-alone stainless-steel frame with polypropylene cabinet)
• Microprocessor Control Capable of Retaining Thirty (30) Recipes in Memory each with up to Thirty (30) steps. Expandable to Ninety (90) programs or with up to thirty (30) steps.
• Built in Safety Interlocks.
• Push Button Lid Open/Close.
• Touch Screen Graphic User Interface (GUI) with Ease of Programming, Security Lockouts, On-Screen Error Reporting, & Data Logging. 
• Up to Two (2) process arms on compact models, and Four (4) process arms in larger systems.
• Designed to SEMI S2/S8 Guidelines

Options:

• Various sizes of edge-grip & vacuum chucks for Wafers, Photomasks, & other Substrates      
• Height Adjustable Self-Cleaning Brush Assembly
• Recipe-controlled vertical arm travel with 0.1mm travel resolution.
• N2 Drying Assist with 0.02 µm Filtration
• Fixed or Oscillating Low Pressure Dispenses 
• Surfactant or Photoresist Dispense Canisters
• Stand-Alone & Cabinet-integrated surfactant mixing systems
• Recipe-controlled process chamber rinse and flush dispenses
• Controllable & Adjustable Chamber Exhaust Assembly
• 0.2 µm Filtration for Low Pressure Dispenses
• D.I. Water Heater & Dispenses
• Oscillating Megasonic DI Water Dispense Arm
• Secondary Containment with Leak Detection

Features:

• Up to Twenty-nine (29) Inch Diameter Substrate on-axis Compatibility with Maximum off-axis substrate size of 9” x 9”, allowing for multiple substrates to be processed simultaneously
• Main Spindle Assembly having Servo Motor with Push Button Indexing
• Adjustable Process Arm Speed & Travel Positions.
• Laminar Flow Exhausted Chamber
• Stand-alone Polypropylene Cabinet. (DCSx607 model has a stand-alone stainless-steel frame with polypropylene cabinet)
• Push Button lock for front opening & Built-in Safety Interlocks
• Built-in Chamber flush Assembly & DI-H2O Line Purge for a Bacteria-Free System
• Microprocessor Control Capable of Retaining Thirty (30) Recipes each with up to Thirty (30) steps in Memory
• Touch Screen Graphic User Interface (GUI) with Ease of Programming & Security
• Lockouts, On-Screen Error Reporting with Data Logging & Reporting per Substrate
• Up to Two (2) process arms on compact models, and Four (4) process arms in larger systems

Options:

• Various sizes of edge-grip & vacuum chucks for Wafers, Photomasks, & other Substrates      
• Height Adjustable Self-Cleaning Brush Assembly
• Recipe-controlled vertical arm travel with 0.1mm travel resolution.
• D.I. Water Heater & Dispenses
• N2 Drying Assist with 0.02 µm Filtration
• Fixed or Oscillating Low Pressure Dispenses 
• Surfactant or Photoresist Dispense Canisters
• Stand-Alone & Cabinet-integrated surfactant mixing systems
• Recipe-controlled process chamber rinse and flush dispenses
• Controllable & Adjustable Chamber Exhaust Assembly
• 0.2 µm Filtration for Low Pressure Dispenses
• Oscillating Megasonic DI Water Dispense Arm
• Secondary Containment with Leak Detection

Features:

• Compatible with Cassette or Carrier of SEMI standard wafers of up to 300mm.
• Process tank having nozzles for top down spray of/or bottom fill of chemicals & DI-H2O.
• Chamber & Substrate Flush for rinse to pH when processing is complete having pH Meter for monitoring the drain output with quick dump for low rinse DI-H2O consumption.
• Staging (holding) tank for processed substrate having DI-H2O for substrate to maintain a wet state while waiting for further processing.
• Reservoir tanks for recirculation chemistries & Temperature maintenance.
• Stand-alone Surfactant mixing system for automatic refill.
• Exhausted Process Chamber & Lower Cabinet.
• Stand-alone Polypropylene Cabinet with all wetted surfaces of PVDF (optional other materials) for Chemical & Temperature Compatibility.
• Built in Safety Interlocks.
• Push Button Lid Open/Close on process tank.
• Microprocessor Control Capable of Retaining up to Thirty (30) Process Programs in Memory with each capable of up to 30 Recipe Steps.
• Touch Screen Graphic User Interface (GUI) with Ease of Programming & Security Lockouts and On-Screen Error Reporting.

Options:

• Heater Element (Teflon coated as need) in Reservoir to Maintain fluids at required temperature.
• Filters for removing contamination from reusable chemistries.
• Megasonic Plate for enhanced Cleaning
• Agitation crank for Substrate Carrier
• Substrate Carriers to Enhance Cleaning with two point contact & open profile.
• Secondary Containment with Leak Detection
• Stainless Steel frame, skin, and structure for Automation Ready Interface.
• Diverter valves for segregation of drains (chemical & facilities) & directing recapture of reusable chemistries
• Load assist mechanisms for larger & heavier loads.
• Built to SEMI & CE Certification Standards